EU tariff 3923109010 Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal, of a kind used in the photolithography or other semiconductor production to house photomasks or wafers

Import duty 6.5% · 1 border control

EU import result

EU import · third-country (MFN) rate · TARIC snapshot 2026-07-06

3923109010Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal, of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Import duty6.5%of customs value · Regulation 1821/163 conditional charges may also apply · see Reporting & relief
Border controls1see Border controls
€6.50estimated duty · 6.5% of value
Rate 6.5% · TARIC: 6.500 %

Selected from the EU TARIC snapshot 2026-07-06.